
SCIL Nanoimprint Solutions, a Philips spin-out, specializes in high-resolution, high-throughput nano-scale lithography for applications in photonics and optics. Their proprietary Substrate Conformal Imprint Lithography (SCIL) technology enables cost-effective, robust, and high-yield patterning of features down to 10 nanometers on substrates up to 300mm. The company partners with global tier-1 vendors and manufacturers, providing equipment, consumables, and support to drive innovations in areas like optical I/O, datacenters for AI, and metaverse applications. They emphasize collaboration, innovation, and impact, with a business model centered around equipment sales and consumables for high-volume production.

SCIL Nanoimprint Solutions, a Philips spin-out, specializes in high-resolution, high-throughput nano-scale lithography for applications in photonics and optics. Their proprietary Substrate Conformal Imprint Lithography (SCIL) technology enables cost-effective, robust, and high-yield patterning of features down to 10 nanometers on substrates up to 300mm. The company partners with global tier-1 vendors and manufacturers, providing equipment, consumables, and support to drive innovations in areas like optical I/O, datacenters for AI, and metaverse applications. They emphasize collaboration, innovation, and impact, with a business model centered around equipment sales and consumables for high-volume production.